| 摘要 |
PURPOSE:To form a resist film having uniform thickness and to obtain a stamper master disk for optical disks which has small variation in recording signal level by irradiating the surface of an original disk with UV/O3 before a resist material is applied and then applying the resist material. CONSTITUTION:While O3 is produced, the surface of the master disk is irradiated with UV light in an O2 atmosphere before the resist material is applied. The wettability of the surface of a metallic vapor-deposited thin film is increased and uniformed by the UV/O3 processing and then variance in the film thickness of the resist film decreases to <=10Angstrom . In this case, the wettability of the surface of the chromium vapor-deposited thin film is increased by the UV/O3 processing and the angle of contacting with pure water is improved to <=5 deg.. Consequently, any original disk has small variance in the thickness of resist at any position of the master disk and a recording signal level becomes stable.
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