| 摘要 |
PURPOSE:To facilitate dry etching and to enhance reliability by forming a photomask made of silicide of multi-element metals, that is, an alloy of 2 or more elements on a transparent glass substrate. CONSTITUTION:The silicide film 4 of multi-element metals, such as Mo, Ti, or W, is formed on the transparent glass substrate 1, coated with a resist 3, and a desired pattern is formed with light or electron beams, and a mask pattern 5 is formed by etching the film 4. The use of the metal silicide permits the obtained photomask material to be easy in etchability, high in productivity, and increased in adhesion to the substrate, and to produce a high-quality photomask. |
