Process of forming ultrafine pattern

摘要

A process for forming an ultrafine pattern on a surface of a substrate, which includes steps of irradiating the substrate surface with radiation modulated according to information to be patterned, subjecting the substrate surface to deposition with a material reactive or not with the substrate, and subjecting the substrate surface to etching if a substrate-reactive material is used for deposition. By this process, an ultrafine pattern can easily be formed with a high accuracy.