| 摘要 |
PURPOSE:To obtain a uniform vapor-deposited film by using a single crystal in the evaporating part of a sputtering target. CONSTITUTION:A metallic single crystal having a perfectly uniform structure is used in a target so as to always cause uniform evaporation from the surface of the target. By the uniform evaporation, a vapor-deposited film of a uniform thickness can be obtd. It is preferable that the target is formed by a known continuous casting method using a heated casting mold. When a metal is continuously cast into an ingot by the method, the surface of the inner wall of the casting mold is kept at a temp. above the solidification temp. of the metal and the cooling of the resulting ingot is carried out at the outside of the outlet end of the casting mold. |
