发明名称 FORMATION OF CARBON FILM
摘要 PURPOSE:To form a hard carbon film with high adhesion on the surface of a substrate by previously forming an org. substance layer on the surface of the substrate and exposing the surface to sputtering or vapor deposition or decomposing a gas contg. hydrocarbon on the surface with the energy of plasma. CONSTITUTION:A soln. prepd. by dissolving 0.1-50vol.% org. polymer in a solvent is applied to or sprayed on the surface of a substrate of a metal, an alloy or an inorg. substance to form an org. substance layer. Polystyrene, polyvinyl acetate, acrylic resin or methacrylic resin may be used as the org. polymer. A carbon film of 0.1-0.001mum thickness is then formed on the surface of the substrate with the org. substance layer in-between by exposing the surface to sputtering or vapor deposition or decomposing a gas contg. hydrocarbon on the surface with the energy of plasma.
申请公布号 JPS61272363(A) 申请公布日期 1986.12.02
申请号 JP19850114034 申请日期 1985.05.29
申请人 HITACHI LTD 发明人 KOKADO YUICHI;KITO MAKOTO;HONDA YOSHINORI
分类号 C23C14/02;C23C14/06;C23C16/26;C23C16/27;C23C16/511;G11B5/72 主分类号 C23C14/02
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