发明名称 METHOD AND APPARATUS FOR CORRECTING PATTERN DEFECT OF GLASS HARD MASK FOR PRINTED CIRCUIT BOARD
摘要 PURPOSE:To correct a pattern defect simply and highly reliably by containing fine light shielding material in both a main agent and a hardening agent constituting a correcting solution of which two components are to be hardened and applying the correcting solution by two stages. CONSTITUTION:Controlled by a modulating power supply 6, a correcting solution 3 is jetted from a jet nozzle 5 connected to a tank 4 for storing the correcting solution 3 to a linear defect pattern part 7 of a glass hard mask 2. On the other hand, a correcting solution 8 is jetted from a jet nozzle 10 connected to a tank 9 for storing the correcting solution 8 to the pattern part 7 of the mask 2 while being controlled by a modulating power supply 11. The pattern part 7 and jetting positoins are displayed on a CRT 14 of a monitor 13 by a TV camera 12 as the intersected point of lines 15, 16. The main agent and the hardening agent are used for the correction solutions 3, 8 respectively, the light shielding material is contained in both the main agent and the hardening agent and the pattern part 7 is detected by operating an X-Y moving table 1 through the camera 12 and the monitor 13. Thus, the pattern defect can be corrected simply and highly reliably by applying the correcting solution of which two compnents are to be hardened by two stages.
申请公布号 JPS61270724(A) 申请公布日期 1986.12.01
申请号 JP19850111661 申请日期 1985.05.25
申请人 HITACHI PLANT ENG & CONSTR CO LTD;HITACHI LTD 发明人 HAYATA FUMITAKA;KOIDE HIDEO;MATSUDA YASUMASA;WAI SHINICHI;AOKI MAKOTO
分类号 H01L21/027;G02F1/00;H01L21/30;H05K3/00 主分类号 H01L21/027
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