PURPOSE:To make uniform the film thickness distribution in the transverse direction by providing a control plate which can change optionally the vapor deposition area by moving along the progressing direction of an object for vapor deposition to a channel outlet connecting an evaporation vessel and the object for vapor deposition. CONSTITUTION:The vapor 10 emitted from the surface of the molten metal in the evaporation chamber 3 in a vapor deposition chamber 2 flows out through a shutter 7 to a channel 6 and deposits on a thin metallic sheet 5 which is the object for vapor deposition and is wound on a roll 9 in the outlet part of the channel. The control plate P for the vapor deposition rate which can change optionally the vapor deposition rate to the sheet 5 by changing the outlet area of the channel 6 is provided between the outlet of the channel 6 and the sheet 5. The plate P can be advanced into and retreated from the channel 6 by the engagement of a pinion S and a rack R when a shaft 11 is rotated. The pressure in the channel is maintained under the pressure adequate for the pressure in the vacuum vessel if the position of the plate P is selected. The film thickness is thus uniformly distributed in the transverse direction of the thin sheet.
