| 摘要 |
PURPOSE:To obtain a film having a substantial antireflection effect by forming two layers; a silicon oxide layer formed by a prescribed method to lambda/4 or lambda/2 film thickness and SiO2 layer formed to lambda/4 film thickness on the surface of an optical member made of a synthetic resin. CONSTITUTION:The antireflection film is formed by providing the high-refractive index silicon oxide layer 2 on an optical member substrate 1 made of the synthetic resin consisting of polymethyl methacrylate and the low-refractive index silicon oxide 3 thereon. The 1st layer 2 is formed by evaporating SiO2 by resistance heating in a vacuum of an oxygen atmosphere and depositing the same and the 2nd layer 3 is formed by evaporating SiO in gaseous oxygen plasma by resistance heating and depositing the same. The substantial antireflection effect is obtd. and both the surface hardness and solvent resistance are improved by forming two layers of the antireflection films in the above-mentioned manner. |
