| 摘要 |
PURPOSE:To improve the step coverage of an insulating layer coated on a surface including the following cross sections by etching an auxiliary insulating layer and the second electrically conductive film with an obliquely injected ion beam and forming an electrode having the tapered cross sections. CONSTITUTION:The first electrically conductive film 12 consisting of a magneto- resistance effect element 1 and a buffer layer 9 and the second conductive film 13 consisting of an electrode layer 2 and an adhesive layer 10 are successively formed on a substrate 11 and the material is worked into a prescribed pattern. Then after the whole surface is coated with an auxiliary insulating layer 8, a mask 14 is formed. Subsequently, the opening part of the mask 14 is etched to the layer 9 by an obliquely injected ion beam while rotating the substrate 11. Consequently, the cross section of the film 13 is etched in a trapezoidal form. Then the layer 9 is etched to expose the element 1, the mask 14 is removed and an upper insulating layer 3 and an upper magnetic shield 5 are successively formed. By this constitution, even when the layer 3 is thinly formed, the contact of the shield 5 with the electrode 2 during the succeeding polishing stage or the sliding of the head on the medium can be prevented.
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