| 摘要 |
PURPOSE:To reduce the manufacturing cost and man-hours on the control of a photo-mask by symmetrizing patterns for two different processes or forming the patterns in specific positional relationship acquired by the combination of symmetry. CONSTITUTION:Patterns 1, 2 and patterns 3, 4 are each shaped by the positional relationship of point symmetry using the plane central coordinates of a semiconductor device as an origin. Consequently, the pattern 1 or the pattern 3 are formed onto a semiconductor substrate, and a mask is turned at 180 deg. and employed, thus acquiring the pattern 2 or the pattern 4. Accordingly, the number of the photo-masks is decreased, thus reducing the manufacturing cost and man-hours on control of these masks. |
