发明名称 VAPOR DEPOSITION METHOD FOR METAL OR THE LIKE ON SYNTHETIC RESIN FILM
摘要 <p>PURPOSE:To improve the quality of a film on which a vapor-deposited film is formed by laminating a synthetic resin film and backing film while tensile force acts thereon and bringing the synthetic resin film into direct contact with a cooling roll along said roll during vapor deposition. CONSTITUTION:A laminated film 15 laminated with the extra-thin synthetic resin film 13 and the backing film 14 is un-wound from an un-winding shaft 16 and the film 14 is separated therefrom along an upper roll 18 while the laminated film is passed between nip rolls 20. The backing film is run to guide rolls 27, 28. The film 13 is separated along a lower roll 19 and is run in contact with the cooling roll 21 along the same. The evaporating metal from a evaporating metal generating source 22 is deposited by evaporation on the film 13. Such film 24 is transferred to a lower roll 26 on nip rolls 25 and is again laminated on the film 14 arriving at an upper roll 29. The laminate 30 thereof is wound on a take-up shaft 31. The wrinkling and sagging of the film 13 are prevented by the above-mentioned method, by which the vapor-deposited film having the good quality is obtd.</p>
申请公布号 JPS61266569(A) 申请公布日期 1986.11.26
申请号 JP19850108963 申请日期 1985.05.21
申请人 MITSUBISHI PETROCHEM CO LTD 发明人 HOSONO TAIJI;OKUYAMA KATSUMI;ITO MINORU;MIZUTANI HIROYASU
分类号 C23C14/20;C23C14/56;H01L41/45 主分类号 C23C14/20
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