发明名称 SPUTTERING DEVICE
摘要 PURPOSE:To prevent the slackening of a long-sized sample and to make uniform a film metal by applying specified tension to the long-sized sample which is guided approximately peripherally around a cylindrical target by means of guide rollers and taking up the sample after a sputtering treatment. CONSTITUTION:The long-sized sample 12 such as fabric or film is guided along the approximately peripheral moving route enclosing the cylindrical target 7 by means of many guide rollers 13 disposed peripherally around the target 7 in a sputtering treatment chamber 3 of a sputtering device body 1 and a voltage is impressed between the target 7 and the anodes 11, by which the sample is subjected to the sputtering treatment. A take-up roller 18 for taking up the sample 12 after the sputtering treatment in the above-mentioned method is turned at the circumferential speed always higher by as much as the prescribed rate than the peripheral speed of a delivery roller 17 for delivering the sample 12 by adjusting rotation driving devices (not shown) for the delivery roller 17 and the take-up roller 18. The specified tension is thereby exerted to the sample 12 in the taking-up direction thereof and the slackening thereof is prevented.
申请公布号 JPS61266574(A) 申请公布日期 1986.11.26
申请号 JP19850109094 申请日期 1985.05.21
申请人 TOYODA GOSEI CO LTD 发明人 MANABE KATSUHIDE;TSUTSUI MASATOSHI
分类号 C23C14/56 主分类号 C23C14/56
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