| 摘要 |
PURPOSE:To form easily a memory disk having high uniformity by forming directly ruggedness on a glass substrate subjected to low temp. type ion exchange treatment thereby eliminating the need for a resin layer. CONSTITUTION:A discoid soda lime glass substrate 1 is subjected to low temp. type ion exchange treatment and is thereby chemically reinforced. The substrate is thereafter subjected to silazane treatment to increase the adhesive force to resist and photoresist is coated on one main surface of the substrate 1 and is prebaked. The photoresist is exposed by using a photomask on a disk patterned with the signals for pregrooves and is further developed, dried and post baked to form a resist pattern 4. The substrate is subjected to sputter etching by using a palallel flat plate type plasma etching device using the resist pattern as a mask, by which grooves 5 are obtd. The resist is stripped by hot concd. sulfuric acid, etc. and the substrate is washed and dried. A substrate 6 for information recording is thus formed. |
