发明名称 GAS MIXTURES AND PROCESS FOR DEPOSITION OF AMORPHOUS SEMICONDUCTORS
摘要 Precursor gaseous mixtures from which to glow discharge deposit wide and narrow band gap semiconductor alloy material, said material characterized by improved photoconductivity and stability and improved resistance to photodegradation. There is also specifically disclosed a method of fabricating a narrow band gap semiconductor which method does not suffer from the effects of differential depletion of the components of the precursor gaseous mixture.
申请公布号 ZA8602255(B) 申请公布日期 1986.11.26
申请号 ZA19860002255 申请日期 1986.03.26
申请人 SOVONICS SOLAR SYSTEMS 发明人 STANFORD R. OVSHINSKY;SUBHENDU GUHA;PREM NATH;CHI CHUNG YANG;JEFFREY FOURNIER;JAMES KULMAN
分类号 H01L31/04;H01L21/205 主分类号 H01L31/04
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