发明名称 |
Dry-processing apparatus |
摘要 |
In a dry-processing apparatus adapted for vapor phase deposition or vapor phase etching, the processing space in its processing chamber is covered with a cooled member provided for trapping reflecting active particles and preventing degassing, thereby permitting processing with gas of high purity substantially free from impurities. The active particles are incident upon a workpiece in a unidirectional flow. Means for uniformalyzing the direction of movement of active particles may be further provided. The apparatus is especially useful for vertical etching of a semiconductor substrate with neutral radicals.
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申请公布号 |
US4624214(A) |
申请公布日期 |
1986.11.25 |
申请号 |
US19850742389 |
申请日期 |
1985.06.10 |
申请人 |
HITACHI, LTD. |
发明人 |
SUZUKI, KEIZO;NINOMIYA, KEN;NISHIMATSU, SHIGERU;OKUDAIRA, SADAYUKI |
分类号 |
H01J37/16;H01J37/305;H01L21/205;H01L21/302;(IPC1-7):H01L21/306 |
主分类号 |
H01J37/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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