发明名称 PLASMA CVD DEVICE
摘要 PURPOSE:To obtain an amorphous film with arbitrary distribution of film thickness, by making conduit tubes to branch symmetrically from a supply plural times, forming the routes to a raw material gas-introduction port which are equal in length and shape, and repeating plural times of symmetrical branches, with plural exhaust ports arranged at the facing side. CONSTITUTION:Raw material gas supplied from a supply port 10 branches in two directions with the same velocity, the same flow rate, and the like, passing through bisymmetrical manifolds at the first branch a1. Similarly symmetrical branches of the raw material gases are repeated at the second branches b1, b2, and the third branches c1-c4, and the branching raw material gases pass through conduit tubes 12 and 13 of respective equal lengths and similar shapes, introduced into a plural number of raw material gas introduction ports 21-28 which are connected in parallel with a reaction area 30, and then sent to the reaction area 30 in a vacuum container 40, as uniform and parallel gas- flow. An exhaust system also has the same composition as the raw material gas-supply system. Coupled with the composition of the raw material gas-supply system, the gas-flows at the reaction area 30 can be controlled so as to be parallel and more uniform.
申请公布号 JPS61263118(A) 申请公布日期 1986.11.21
申请号 JP19850103276 申请日期 1985.05.15
申请人 SHARP CORP 发明人 INAMI TAKASHI;HIJIKIGAWA MASAYA
分类号 H01L31/04;C23C16/44;C23C16/455;H01L21/205 主分类号 H01L31/04
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