发明名称 IN-SITU CVD CHAMBER CLEANER
摘要 <p>An electrode structure (12) for inserting into an LPCVD tube (32) or RPE bell jar (42) to effect cleaning of deposited material from the inner wall (33) or (43) thereof. A base plate (22) of said structure has an O-ring seal (23) which matingly engages a base (34) of the tube or base (44) of the bell jar (42), such that a vacuum seal is created upon evacuation of the same utilizing a vacuum pump system (50). A pressure detector (24) in the form of a capacitance manometer is utilized to mesure the pressure within such tube or jar, and a gas flow control device (26) in the form of a mass flow controller is utilized to control the flow rate of etching gas. Gas is uniformly distributed in the tube or bell jar by a gas distribution tube (13).</p>
申请公布号 WO1986006687(A1) 申请公布日期 1986.11.20
申请号 US1985002167 申请日期 1985.11.04
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址