| 摘要 |
PURPOSE:To obtain a band-pass filter having high spectral characteristics with high reproducibility and to improve its yield by combining two laminated layers consisting of a high refractive index substance and a low-refractive index substance as one group and controlling the optical film thickness of the multi-layer film by using one monitor substrate in each group. CONSTITUTION:In an electron beam vapor depositing device, the optical film thickness of each two layers successively laminated from the substrate side out of the number of layers of the band-pass filter and that of the final layer are controlled by using twelve monitor substrates 2 successively at the position of a monitor part 1. Namely, the vapor deposited film thickness of consisting of the layer H a high refractive index substance and the layer L (or 2L) of a low-refractive index substance is controlled by each monitor substrate 2 and only the final layer consisting of a high refractive index substance is controlled by one monitor substrate. A crucible 23 for storing vapor deposition sources 20 is shaped like a disc enabled to store plural pieces of two kinds of substrates consisting of titanium dioxide and silicon dioxide. In case of vapor depositing a prescribed substrate, the substance is rotated and carried to a position to which emission current is reached from an electron gun.
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