| 发明名称 |
A METHOD FOR POLISHING SEMICONDUCTOR WAFERS WITH MONTMORILLONITE SLURRY |
| 摘要 |
Semiconductor wafers are polished with an abrasive slurry which is prepared by dispersing montmorillonite clay in deionized water. The pH of the slurry is adjusted to 9.5. to 12.5 by adding alkali such a NaOH or KOH. An oxidizing agent need not be included in the slurry. |
| 申请公布号 |
DE3367042(D1) |
申请公布日期 |
1986.11.20 |
| 申请号 |
DE19833367042 |
申请日期 |
1983.06.23 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BASI, JAGTAR SINGH;MENDEL, ERIC |
| 分类号 |
H01L21/304;C09G1/02;H01L21/306;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/304 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
