发明名称 |
VERFAHREN ZUM AUFWACHSEN EINER GAAS-EINKRISTALLSCHICHT |
摘要 |
Triethylgallium (TEG) and arsine (AsH3) are used as gaseous compounds for growing a GaAs monocrystal semiconductor film. One gas is introduced into the vacuum tank and then discharged after the passage of a predetermined time, and the other gas is introduced thereinto and the discharged after the passage of a predetermined time whereby a crystal for one molecular layer grows. By use of TEG as a gallium source, reaction progresses even when a temperature of the base is below 300 DEG C, and a GaAs monocrystal film which is extremely less in lattice failure and impurities was obtained. <IMAGE> |
申请公布号 |
DE3616358(A1) |
申请公布日期 |
1986.11.20 |
申请号 |
DE19863616358 |
申请日期 |
1986.05.15 |
申请人 |
RESEARCH DEVELOPMENT CORP.;NISHIZAWA,JUNICHI;ABE,HITOSHI |
发明人 |
NISHIZAWA,JUNICHI;ABE,HITOSHI |
分类号 |
H01L21/205;C30B25/02 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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