发明名称 PHOTOSENSITIVE POLYMER COMPOSITION
摘要 PURPOSE:To provide the titled compsn. which gives a film which cause neither reduction in thickness nor cracking and can provide a fine relief pattern, containing a high-molecular compd. contg. amide-imide linkages and a bisazide. CONSTITUTION:100pts.wt. high-molecular compd. (A) having an intrinsic viscosity of 0.1-1.5 (in N-methylpyrrolidone, 0.5g/dl at 30 deg.C) and contg. an amide-imide linkage of formula I (wherein Y is a trivalent arom. group; R' is a bivalent org. group) obtd. by reacting an arom. tricarboxylic acid monoanhydride and optionally, an arom. or aliph. dianhydride with a diisocyanate compd. in an org. solvent is blended with 0.1-100pts.wt. bisazide (B) of formula II, III or IV (wherein X is -N3, -SO2N3; R<4> is H, lower alkyl; R<6> is alkylene, SO2, S, O, a group of formula V or VI; Y is O, S, NH; m is 0, 1; l is 1-5).
申请公布号 JPS61261355(A) 申请公布日期 1986.11.19
申请号 JP19850102209 申请日期 1985.05.14
申请人 HITACHI CHEM CO LTD 发明人 SATO TONOBU;TSUCHIYA KATSUNORI;KOJIMA MITSUMASA;UCHIMURA SHUNICHIRO;MAKINO DAISUKE
分类号 C08K5/28;C08L79/08;G03F7/012;G03F7/038 主分类号 C08K5/28
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