发明名称 RESIN FOR SEALING SEMICONDUCTOR
摘要 <p>PURPOSE:The titled resin decreased in void formation, obtained by heating at least one of the organic components of a semiconductor sealing material in vacuum. CONSTITUTION:The titled resin is obtained by heating at least one of the organic components of a semiconductor sealing material, such as an epoxy resin, a phenolic resin as a curing agent, a catalyst, a mold release, etc., at 100-150 deg.C in a vacuum <=10mmHg for several hr mixing this component with, optionally, an inorganic substance such as a silicon powder or a colorant (e.g., carbon).</p>
申请公布号 JPS61261315(A) 申请公布日期 1986.11.19
申请号 JP19850102208 申请日期 1985.05.14
申请人 HITACHI CHEM CO LTD 发明人 KITAMURA MASAHIRO;SUZUKI HIDEO
分类号 C08G59/00;C08G59/02;C08G59/18;C08L7/00;C08L21/00;C08L63/00;H01L23/29;H01L23/31 主分类号 C08G59/00
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