发明名称 |
POST-TREATMENT AFTER ETCHING WITH HYDROGEN PEROXIDE AND SULFURIC ACID |
摘要 |
PURPOSE:To prevent the defective fusing of the solder surface of an etched wiring board by blackening, by treating the board with alkali metallic hydroxide and a compound such as silicate or phosphate. CONSTITUTION:A printed wiring board is etched with an etching soln. contg. hydrogen peroxide and sulfuric acid as the principal components. The etched board is treated with a post-treating agent obtd. by blending alkali metallic hydroxide with one or more kinds of compounds selected among silicates, phosphates, borates and aliphatic oxycarboxylates.
|
申请公布号 |
JPS61261484(A) |
申请公布日期 |
1986.11.19 |
申请号 |
JP19850101031 |
申请日期 |
1985.05.13 |
申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
NAKAZATO TOSHIHIRO;KAJIWARA SHOICHIRO;IKETANI ITARU;SATOU YASUHIRO;OSHIDA YUTAKA |
分类号 |
C23F1/18;C23F1/00;H05K3/06;H05K3/22;H05K3/28 |
主分类号 |
C23F1/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|