发明名称 METHOD AND DEVICE FOR PLASMA PROCESS
摘要 PURPOSE:To enable a material being processed to be processed by plasma at a high speed and moreover uniformly by a method wherein vertical magnets and a horizontal magnet are provided on a yoke, and the high density part and the low density part are provided to magnetic flux to meet at right angles with an electric field. CONSTITUTION:A magnetic element 8 is constructed on a yoke 40 according to vertical magnets 41, 42 and a horizontal magnet 43, the S-pole and the N-pole are arranged on the surface sides of the magnets 41, 42, and the magnet 43 is arranged by making polarities to coincide therewith. The magnets 41, 42, 43 form scroll type together, and extend to the circumference of the yoke from the neighborhood of the center of rotation O. Because the interval d3 between the magnets inserted with the magnet 43 is narrower than the interval d4 between the magnets not inserted with the magnet 43, and moreover reinforced with the magnet 43, a magnetic field of high magnetic flux density is constructed in the direction meeting at right angles with an electric field between the magnetic having width d3, and a magnetic field of middle grade is constructed in the direction meeting at right angles with the electric field between the magnets having width d4. Accordingly, the high-speed and uniform processing of a material to be processed can be attained.
申请公布号 JPS61260635(A) 申请公布日期 1986.11.18
申请号 JP19850101230 申请日期 1985.05.15
申请人 HITACHI LTD 发明人 KAKEHI YUTAKA;HARADA TAKESHI;OMOTO YUTAKA
分类号 H01L21/302;C23F4/00;H01J37/32;H01L21/3065 主分类号 H01L21/302
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