| 摘要 |
PURPOSE:To prevent effect of light reflected from a support and swelling of a photohardened product due to a developing soln., and to enhance resolution, dry etching and heat resistances by incorporating a polymer soluble in an aq. alkaline soln., a siloxane ladder polymer, and an aromatic azido compound. CONSTITUTION:The photosensitive compsn. contains a polymer soluble in an aq. alkaline soln., such as a novolak resin, a hydroxystyrene polymer, or poly(meth)acrylic acid, in the form of a homocondensate, cocondensate, homopolymer, or copolymer; a siloxane ladder polymer; and an aromatic azido compound, thus permitting the obtained photosensitive compsn. to be unaffected by the light reflected from the support, to be formed into a rectangular micropattern because this photohardened product is not swelled with a developing soln., and to be subjected to dry etching treatment after formation of the pattern, without trouble, such as exhaustion of a resist before completion of perfect etching of the layer to be treated, or thinning of pattern width, and to resist heat treatment even >=150 deg.C. |
