发明名称 |
Silver halide photographic light-sensitive materials |
摘要 |
A silver halide photographic light-sensitive material is described, comprising a support having thereon at least one silver halide photographic light-sensitive emulsion layer, said photographic light-sensitive material further comprising at least one light-insensitive surface layer on at least one side thereof, at least one of said surface layer or layers comprising a graft polymer or copolymer having a silicone unit, and at least one of said surface layer or layers and a layer or layers adjacent to the surface layer or layers comprising an antistatic agent. The silver halide light-sensitive material has good antistatic property and reduced sliding friction without giving bad influences on the photographic properties; has good antistatic property and lubricity after development processing; has improved antistatic property and lubricity without reducing the coating properties at the production of the photographic light-sensitive material; and forms no scum during development processing.
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申请公布号 |
US4623614(A) |
申请公布日期 |
1986.11.18 |
申请号 |
US19850763111 |
申请日期 |
1985.08.07 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
YONEYAMA, MASAKAZU;MAEKAWA, YUKIO;YOKOYAMA, SHIGEKI;YAMANOUCHI, JUNICHI |
分类号 |
C09K3/16;G03C1/04;G03C1/053;G03C1/06;G03C1/76;G03C1/85;(IPC1-7):G03C1/84 |
主分类号 |
C09K3/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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