| 摘要 |
PURPOSE:To develop a high resolution low molecular weight resist or to uniformly develop a resist when a large diameter wafer is used by atomizing a developer in a foggy state above a wafer, uniformly raising the developer on the wafer by natural dropping of the developer. CONSTITUTION:A mist ring nozzle 2 for atomizing the mist of developer is formed on a ring-shaped that the nozzle is disposed around a wafer 1. The shape, size and angle of the nozzle 2 are adjusted so that mists C, D of the developer injected above the wafer 1 are fallen on the upper surface 11 of the wafer 1 as uniform as possible. A mist forming unit 2' for forming the developer in foggy state to form atomizing means may employ means for injecting the developer together with inert gas (e.g., N2), injecting the developer with high energy from a fine nozzle or applying a vibration to the nozzle. A cover 3' is mounted on a developing cup 3, a fulcrum 5 is movable around the center to move a flowing nozzle 4 above the wafer 1 only at rinsing time, thereby preventing the developer from dropping on the wafer. |
