| 摘要 |
PURPOSE:To improve the characteristics, evenness and yield etc. of plasma processing while avoiding excessive or insufficient plasma processing by means of facilitating to optimize the distribution of plasma processing speed. CONSTITUTION:In order to select and control the conductance of throughholes 3 connecting a plasma producing chamber 1 to a plasma processing chamber 2, the length of through-holes 3 is selectively distributed. Assuming the diameter of throughholes 3 to be e.g. around 1mm under the pressure of around 1torr normally applicable to the plasma processor, the conductance of throughholes 3 for any active species will be the linear function of inverse number of the length of throughholes 3 so that the fine control of conductance may be made feasible very easily comparing with the conventional control etc. by the diameter proportional to cube. |
