发明名称 TARGET MATERIAL FOR SPUTTERING
摘要 PURPOSE:To enhance the utilization efficiency of the resulting titled target material by producing a mechanical strain in a plastically deformable magnetic material. CONSTITUTION:A mechanical strain is produced in a plastically deformable magnetic material such as 'Permalloy(R)' by a plastic deforming means such as rolling, forging or pressing. At this time, the working temp. is preferably regulated to the recrystallization temp. of the material or below, especially the restoration temp. or below so as to effectively produce the strain. Thus, the coercive force of the material is increased or the magnetic permeability is reduced, and when the resulting target material is fixed in the magnetic circuit of a sputtering apparatus, magnetic flux leaking out of the surface of the material is increased. The material is eroded in an extended region, sputtering is carried out with improved efficiency and the utilization efficiency of the target material can be enhanced.
申请公布号 JPS61257473(A) 申请公布日期 1986.11.14
申请号 JP19850097192 申请日期 1985.05.08
申请人 SUMITOMO SPECIAL METALS CO LTD 发明人 SUZUKI KIKUO;NOSE MASATERU
分类号 C23C14/36;C23C14/35;G11B5/85;G11B5/851 主分类号 C23C14/36
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