| 摘要 |
PURPOSE:To obtain a minute pattern by a method wherein when an electrode of minute width is arranged on a substrate by liftoff technique, the two-layer laminated films of positive resist films are arranged and the exposed parts of the laminated films are made soluble by arranging a mask having the width corresponding to that of an electrode ad then the exposed parts of the films after removing the mask are changed into a hard-soluble film and the soluble parts are removed. CONSTITUTION:A positive photosensitive resist is spread over the piezoelectrice substrate 5 composing a piezoelectric element. It is baked to be made into a resist film 6, which is then exposed to ultraviolet rays to be made into the solubilized, first resist film 6a. The second resist film 7 is arranged on said film 6a and a mask 8 having predetermined openings is put on that, followed by exposure to ultraviolet rays to make the exposed parts of the film 7 into a solubilized film 7a whereas leaving the film 7b consisting of the film 7 under the mask 8. After that, the surface of the exposed film 7 after removing the mask 8 is subjected to xylene treatment to be changed into a hard-soluble layer 9. After removing the film 7a by fusion, an Al film 10 is spread while disconnecting it in those positions and the film 6a is removed together with the film lying on it to leave only the Al conductor pattern 11 of a predetermined shape on the substrate 5. |
