| 摘要 |
<p>PURPOSE:To obtain a stable mask for X-ray having a fresh base film by using a diamond-like carbon film or composite laminated film consisting essentially of the diamond-like carbon film as an X-ray transmittable base film and forming an X-ray absorptive material pattern thereto. CONSTITUTION:A 2'' silicon wafer is used and diamond-like carbon is formed to about 0.5mum thickness by a magnetron sputtering method using a graphite target onto such substrate. A Ta film is formed on the surface thereof again by sputtering and after a fine pattern is formed thereon, an X-ray mask is formed by back etching, by which <=0.1mum accuracy of the pattern position in a packaged state is realized and the result of the contrast in the stage of exposing as good as 22 is obtd. The base film has a small coefft. of X-ray absorption and high mechanical strength and therefore the relatively thin construction is possible if such base film is used and the use of heavy metals or the compds., etc. thereof over a wide range as an X-ray absorption pattern material is made possible.</p> |
