| 摘要 |
<p>PURPOSE:To make possible the sure realization of patterning of a sub-micron size by patterning a metallic film with a mask member having the corrosion resistance higher than the corrosion resistance of a metallic film as a mask thereby forming easily the metallic film having the prescribed pattern onto a glass substrate to the extremely high shape accuracy. CONSTITUTION:The metallic film 21 consisting of chromium, etc. is formed to a prescribed film thickness on the glass substrate 20, then a resist film 22 is formed on the film 21. The film 22 is subjected to selective exposing, then to developing to form an aperture 23. A mask layer 24 is formed only on the surface of the film 21 exposed through the aperture 23 by an electroplating method with the film 21 as an electrode. Gold, platinum, molybdenum, tungsten, copper, etc. having excellent corrosion resistance are used as the mask layer 24. The film 22 is then dissolved in a solvent and is removed by etching and thereafter the film 21 is patterned by a prescribed etching soln. with the remaining mask layer 24 as a mask. The glass mask 30 of a positive type formed with the remaining film pattern 25 is obtd.</p> |
