摘要 |
PURPOSE:To perform accurate reflection light measurement without any deviation in the weight of a photometric distribution by shielding part or the whole of the front surface of a blade having a low reflection factor by other blades or other members during the movement of the 1st shutter blade group. CONSTITUTION:The blade group 21 arranged in front of beside a film 1 consists of strip type thin and laterally long blades; a slit formation blade 21a which has a high reflection factor nearly equal to that of a film surface is positioned at an uppermost position and then three stripped shutter opening/closing blades 21b, 21c, and 21d having a high reflection factor and one shutter opening/closing blade 21e having a low reflection factor are arranged successively below in a louver door shape so that they are opened closed without causing exposure, thereby covering an exposure aperture part 4. The lower end part of the shutter opening/closing blade 21e enters the storage part 23a formed of base plates 24a and 24b for shutter block formation to form a sufficient space where the 1st shutter blade group 21 is put after running, and a storage part 23b for storing the shutter blade group is formed in front of the storage part 23a by using base plates 24b and 24c for shutter block formation.
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