| 摘要 |
<p>PURPOSE:To prevent the deterioration of resolution by the difference in beam width arising from the potential difference between both terminals to be impressed to a wire-shaped hot cathode, the fluctuation of beam width by a voltage fluctuation, etc. by providing a phosphor to be coated on the surface of electron beam control electrodes into a belt shape at the specified width in the longitudinal direction and making wider the electron beam than the width of the phosphor. CONSTITUTION:The coating width of the phosphor is made smaller than the electron beam width. The phosphor for low-velocity electron rays, for example, ZnO:Zn is used for, for example, the phosphor 6. The width of the phosphor 6 is made approximately the same as the pitch of the electron beam control electrode, for example, 100mu pitch. A transparent insulator, for example, glass plate is used for a luminous plate 4 and plural pieces of the transparent electron beam control electrodes 5 are arranged on the surface thereof. The transparent electrodes are formed of an ITO film or 'NESA(R)' film by an etching technique, etc. The line source having 80mum width of the phosphor uniform over the entire length is obtd. even if the width of the electron beam is >=200mum at both ends by coating the belt-like phosphor at 80mum width on the surface in the longitudinal direction.</p> |
