| 摘要 |
PURPOSE:To obtain a polymer superior in oxygen plasma resistance by incorporating a specified unit in a siloxane skeleton. CONSTITUTION:The siloxane skeleton contains, in an amt. of >=40mol%, essential units each represented by the formula shown on the right in which R1 is H or a monovalent org. group except an aromatic group; R2, R3 are each H, Cl, or a monovalent org. group; l is an integer of 1-6; and k is 1 or 2. Since this siloxane polymer is soluble in general-purpose org. solvents, it can be formed into a film, and since it is soluble in aq. alkaline solns., it can be used as an alkali-developable positive type resist by combining it with o- quinonediazides and as an alkali-developable negative type resist by combining it with bisazides, and this siloxane polymer itself alone can be used an alkali- developable negative type electron beam resist, and it can be used as an alkali- developable positive type electron beam resist by combining it with poly(olefinsulfone). |
