METHOD AND APPARATUS FOR PRODUCING CHEMICALLY ACTIVE ENVIRONMENT FOR PLASMA CHEMICAL REACTIONS NAMELY FOR DEPOSITION OF THIN LAYERS,申请号CS19850004407-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR PRODUCING CHEMICALLY ACTIVE ENVIRONMENT FOR PLASMA CHEMICAL REACTIONS NAMELY FOR DEPOSITION OF THIN LAYERS
摘要
申请公布号	CS246982(B1)	申请公布日期	1986.11.13
申请号	CS19850004407	申请日期	1985.06.17
申请人	BARDOS,LADISLAV,CS;MUSIL,JINDRICH,CS;DUSEK,VLADIMIR,CS;VYSKOCIL,JIRI,CS	发明人	BARDOS,LADISLAV,CS;MUSIL,JINDRICH,CS;DUSEK,VLADIMIR,CS;VYSKOCIL,JIRI,CS
分类号	C23C16/513;H01J37/32;(IPC1-7):H05H1/00	主分类号	C23C16/513
代理机构		代理人
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