Monitoring technique for plasma etching.,申请号EP19860105008-传众专利搜索

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发明名称	Monitoring technique for plasma etching.
摘要
申请公布号	EP0200952(A2)	申请公布日期	1986.11.12
申请号	EP19860105008	申请日期	1986.04.11
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	CHEN, LEE;MATHAD, GANGADHARA SWAMI
分类号	H01L21/302;H01J37/32;H01L21/3065;(IPC1-7):H01J37/32;G01N27/00;C23F4/00	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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