| 摘要 |
PURPOSE:To ensure a sufficient electrical conductivity, to form a gold-plated layer only in an opening portion of an insulating film of photosensitive resin and to manufacture a wiring substrate easily, by constructing an electrode wiring portion of two layers of an evaporation film of metal chrome and a metal nickel film. CONSTITUTION:A metal chrome film 9 for an electrode/a wiring is formed by evaporation on an insulating substrate 1 and, a light-receiving portion on this film 9 being masked with a resist pattern 15, a metal nickel film 10 for an electrode/a wiring is deposited on the film 9. Next, after the pattern 15 is removed, a resist pattern 14 is applied by coating, and only a portion to be plated with gold is exposed and developed to form an opening portion 12 on the layer 10. A gold-plated portion 13 is formed in this opening portion 12 by electrolytic gold plating. Thus, an electrode wiring portion of a wiring substrate for a photoelectric transfer device is constructed of two layers of the metal chrome film and the metal nickel film. Thereby a sufficient electrical conductivity is ensured, a gold-plated layer is formed only in the opening portion of the insulating film of photosensitive resin, and thus the quantity of gold to be used is reduced. |
