发明名称 EXCITED EMISSION INTENSITY MEASURING APPARATUS
摘要 PURPOSE:To prevent the lowering of the reflectance with the attaching of material particles to an observation window, by providing a metal thin film at a corner of a roughly L-shaped observation light-guide to make material particles approaching the light-guide attach to the thin film. CONSTITUTION:A light guide cylinder 4 for observation is formed in a roughly L shape and a fine hole is provided at the tip located near a plasma emitting body 1 to form a light-guide port 2 while a metal thin film 11 is arranged at a corner of the light-guide cylinder 4 at a specified angle so that light from the guide port 2 will pass through an observation window 5 via a focusing lens 3. With such an arrangement, material particles scattered by the plasma emitting body 1 approach the light-guide cylinder 4 and mostly attach to the thin film 11. On the other hand, the plasma emission light is reflected on the thin film 11 and focused with the lens 3 to be introduced into the atmosphere from the observation window 5. Then, as the thin film 11 is advanced bit by bit with a winding motor 12, the emission light is reflected on a fresh surface without attached material particles, thereby preventing the lowering of the reflectance.
申请公布号 JPS61253444(A) 申请公布日期 1986.11.11
申请号 JP19850094666 申请日期 1985.05.01
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NISHINO SEIJI
分类号 G01N21/15;G01N21/62;G01N21/73 主分类号 G01N21/15
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