| 摘要 |
PURPOSE:To enable the performing of accurate and highly accurate inspection of foreign matters, by arranging a detector section, a computing section, an output section and the like to clearly distinguish signals generated from a pattern shape from specific signals generated from foreign matters. CONSTITUTION:After a semiconductor wafer 1 is placed on an XY table 3, a pattern detection system 6 is operated to detect a pattern 2 with an optical element 5 as electrical signal scanning the element pattern 2 on a wafer 1. The signal is distinguished with a detector section 8 from specific signals as such corresponding to the pattern. Then, the specific signals are sent out to a computing section 9 to be compared with pitch dimensions of a chip as reference. Then, an output section 10 compares the specific signals with all the signals detected by the detector section 8 while determining the difference therebetween to leave non-regular signals alone, which are outputted. Thus, a foreign matter or a pattern defect due to the foreign matter on the wafer 1 can be inspected by confirming the coordinate position of the signal. |
