发明名称 PHOTOSENSITIVE RESIST INK AND MANUFACTURE OF PS PLATE BY USING IT AND METHOD FOR ETCHING THIS PS PLATE
摘要 PURPOSE:To enhance resolution by incorporating a photoresist contg. a photosensitive agent, and a resin to be solubilized or insolubilized in a developing soln. by exposure in the presence of a photosensitive agent, or a photoresist contg. a photosensitive resin, and a body pigment. CONSTITUTION:The photosensitive resist ink contains the photosensitive agent and a resin to be solubilized or insolubilized in a developing soln. by exposure in the presence of the photosensitive agent or a photoresist contg. a photosensitive resin and a body pigment. The surface of a base having at least metallic surface at other surface is coated with this ink by the screen printing process. The ratio of the photosensitive agent to the resist resin in the photoresist is (5-50):100wt. and in the case of using the photoresist to be developed with an alkaline developing soln., its ratio is (10-30):100, thus permitting a photosensitive resist ink adapted to the screen printing process to be obtained and the ink layer of the PS plate to be made uniform in thickness and superior in resolution.
申请公布号 JPS61252546(A) 申请公布日期 1986.11.10
申请号 JP19850094768 申请日期 1985.05.01
申请人 UENO KAGAKU KOGYO KK 发明人 TOKURA MASAO;TANIGUCHI SHOJI;WAKASAKI NOBUHIKO;MINAMOTO YOSHIZO
分类号 G03C1/74;G03C1/00;G03C1/72;G03C7/08;G03F7/004;G03F7/038;G03F7/16 主分类号 G03C1/74
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