发明名称 MOLECULAR BEAM SOURCE FOR MOLECULAR BEAM CRYSTAL GROWTH APPARATUS
摘要 PURPOSE:To prevent the wall of growth chamber to be heated unreasonably by providing a heat shielding material in the vicinity of the molecular beam irradiation port at the external circumference of crucible and providing a heater only to the region near to the bottom from the heat shielding material. CONSTITUTION:The molecular beam material 2 is melted in a crucible 1 and it is irradiated as the molecular beam 3. A thermocouple 4 is used for controlling temperature of the crucible 4. The heat shielding material 5 is arranged close to the external circumference of crucible 1 at the position in the distance of about 10mm from the molecular beam irradiation port 11 of the crucible 1. The heater 6 is provided in order to heat only the region near the bottom 12 from the heat shielding material 5 avoiding the irradiation port 11. The heat shielding cylinder 7 shields heat of the heater 6.
申请公布号 JPS61251116(A) 申请公布日期 1986.11.08
申请号 JP19850092504 申请日期 1985.04.30
申请人 FUJITSU LTD 发明人 IGARASHI TAKESHI;SAITO JUNJI
分类号 C30B23/08;H01L21/203 主分类号 C30B23/08
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