| 摘要 |
PURPOSE:To decrease the evaporation, splash and oxidation of a processing liquid and to make possible the smooth conveyance of photosensitive materials without damaging the surfaces thereof by providing a cap member having a slit through which the photosensitive materials pass to at least one tank of processing liquid tanks and constituting the tanks in such a manner that the processing liquid overflows from the slit. CONSTITUTION:The photosensitive materials 3, when inserted from a supply base 2 into a photosensitive material intake port 6, are passed by conveying rollers 7 through the conveyance path 9 of the developing soln. tank 10, fixer tank 11 and rinsing liquid tank 12, by which said materials are subjected to the developing process. The materials 3 are inserted through the slit 17 of the cap member 14 and are taken out of the other slit 18 when said materials are carried into the tank 10. The upper part of the tank 10 is covered by the member 14 and the aperture area thereof is made of only the aperture by the slits 17, 18 and therefore the area at which the developing soln. 19 contacts with air is minimized and the oxidation and evaporation of the developing soln. 19 are prevented. The soln. 19 overflows at all times from the slits 17, 18 of the member 14. The sticking of the soln. 19 to the inside of boss parts 15, 16 and the consequent clogging of the slits 17, 18 by the crystals thereof are thus obviated.
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