| 摘要 |
PURPOSE:To decrease the number of the exchange of a photomask and to improve productivity in the production of a small quantity and diversified kinds such as semi-custom LSIs by drawing several kinds of chip patterns different from each other onto a photomask used for a reduction projection type exposing device. CONSTITUTION:Light 2 is irradiated from above onto the mask drawn with different kinds of ROM code patterns 3 on the photomask 1 used in a reduction projection type exposing device (stepper) and the patterns 3 are stopped down by an electron lens 4 so that the photoresist 6 on a wafer 5 is exposed. The wafer 5 is then vertically and horizontally moved and the operation is repeated until the entire surface of the wafer 5 is exposed. Then the production of a small quantity products such as samples for user evaluation and sample for trial manufacture by using 1/n masks 1 is thus made possible efficiently by drawing n-kinds of the ROM code patterns to a sheet of the mask 1. |
