DEVICE FOR PHOTOLITHOGRAPHICALLY TREATING A THIN SUBSTRATE

摘要

A device for photolithographically treating a thin substrate comprises pre-alignment station, a substrate-supporting table and a transport arm which is provided with a vacuum connection for holding the substrate by suction at its lower side during transport of the substrate from the pre-alignment station to the substrate table. The substrate table is provided with supporting means for the substrate which are adjustable in the direction of height and which have a supporting surface which is adjustable to a distance above the substrate table exceeding the thickness of the transport arm and is adjustable in a downward direction at least through a distance such that the supporting surface is level with the upper surface of the substrate table, the supporting means leaving a space free for the movement of the transport arm above a part of the substrate table.