| 摘要 |
PURPOSE:To acquire a thick and precise cell layer simply, by etching a glass layer with a mask of a resistant film, after forming an etching-resistant layer, a glass layer, and a resistant film of a specific pattern, on a panel. CONSTITUTION:In an insulator layer 12 formed on a panel 11 are formed discharge electrodes 2 and 4 and a protection layer 5 of MgO. On the insulator layer 12, a membrane 13 mixed with borosilicic acid glass powder and a binder, for example, with a high anticorrosion property against nitric acid to be an etching solution, is spread and dried up. on the membrane 13, a membrane 14 mixed with soda-lime glass powder and a binder is spread, dried, and baked up. Furthermore, over the membrane 14, a resistant film pattern 15 is formed. After that, the membrane 14 under the film 15 is etched by etching the panel with the resistant pattern 15 as a mask, by using a solution of nitric acid of 15wt%. Then, the resistant film 15 is removed with a film removing solution, to form a cell layer consisting of the membrane 14 with a specific pattern.
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