PRODUCTION OF MASK CONSTITUTING BODY FOR LITHOGRAPHY

摘要

PURPOSE:To obtain a mask constituting body having good X-ray transmittability and substantial flatness by forming a mask holding body consisting of an Al-N-O film on a substrate and adhering a frame thereto then removing the substrate. CONSTITUTION:A polyimide film 2 is formed on one surface of a silicon wafer 1 and after the Al-N-O film 3 is formed thereon, an epoxy adhesive agent 5 is coated on the surface and the surface of the Al-N-O film is adhered to the adhesive agent-coated surface. The Al-N-O film 3 and the polyimide film 2 are then lanced along the outside circumference of a ring frame 4 and ultrasonic waves are acted thereto in an aq. soln. added with a surface active agent to separate and remove the silicon wafer 1. The polyimide film 2 is removed by a hydrazine solvent. The mask constituting body for lithography fixed with the Al-N-O film 3 to the ring frame 4 is thus obtd.