发明名称 PHOTOCHEMICAL VAPOR DEPOSITION EQUIPMENT
摘要 PURPOSE:To make the thickness of a film formed on the surface of a substrate uniform by a method wherein laser beams are applied from both sides of the provided substrate when the film is formed on the surface of the substrate. CONSTITUTION:Laser beams from laser sources 12 and 13 provided outside a reaction container 1 are projected through light projection windows 10 and 11 respectively so that the laser beams are projected in parallel to the surface of a substrate 6 from both sides of the substrate 6. With this constitution, a substrate with a uniform film thickness distribution can be manufactured.
申请公布号 JPS61248424(A) 申请公布日期 1986.11.05
申请号 JP19850090358 申请日期 1985.04.25
申请人 FUJITSU LTD 发明人 WATABE TAKUYA
分类号 H01L21/205;H01L21/263;H01L21/31 主分类号 H01L21/205
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