发明名称 |
Photosensitive composition and pattern forming process using same. |
摘要 |
<p>A photosensitive composition comprising (1) at least one diazonium compound selected from among salts and double salts of diazonium ions represented by the general formulas:
<Chemistry id="chema01" num="0001"><Image id="ia01" he="25" wi="54" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /></Chemistry>wherein A stands for a substituent selected from among
<Chemistry id="chema02" num="0002"><Image id="ia02" he="14" wi="83" file="IMGA0002.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /></Chemistry>and
<Chemistry id="chema03" num="0003"><Image id="ia03" he="14" wi="74" file="IMGA0003.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /></Chemistry>wherein R, and R<Sub>2</Sub> each stand for an alkyl or benzyl group with the proviso that the total number of carbon atoms of R, and R<Sub>2</Sub> is 8 to 16, and (2) at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate and a pattern forming process using such a composition.</p><p>This composition gets sticky upon exposure to light.</p> |
申请公布号 |
EP0200110(A1) |
申请公布日期 |
1986.11.05 |
申请号 |
EP19860105341 |
申请日期 |
1986.04.17 |
申请人 |
HITACHI, LTD. |
发明人 |
MORISHITA, HAJIME;NONOGAKI, SABURO;HAYASHI, NOBUAKI;UCHINO, SHOICHI;NISHIZAWA, MASAHIRO;MIURA, KIYOSHI;SASAYA, OSAMU;TOMITA, YOSHIFUMI |
分类号 |
G03F7/28;G03F7/038;G03C1/08;G03C1/60;G03C5/18;H01J9/227;(IPC1-7):G03C5/00;H01J29/22 |
主分类号 |
G03F7/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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