发明名称 EXPOSURE EQUIPMENT
摘要 PURPOSE:To make it possible to prevent pattern aberration caused by the yawing of the stage, by mounting the square for length measurement applying the laser interferometer on the theta-stage. CONSTITUTION:The theta-table 42 which mounts the original sheet or the body to be exposed and can rotate in the specified plane, the XY-table 44 which loads the theta-table and can travel in the direction parallel to the specified plane, and the laser interferometers 61-63 which measure the travel distance of the original sheet or the body to be exposed as the result of travel of the XY-table are installed. In this exposure equipment, the square (mirror in the form of L) 43 is mounted on the theta-table 42. The yawing angle theta can be obtained from the indications of the laser interferometers 61 and 62 and the distance between them. Therefore, by rotating the theta-table so as to compensate the yawing angle thetaafter the step shift and, if necessary, by compensating the position in the direction of XY by moving the XY-table, it is possible to fix the position of the substrate stage 4 with high precision.
申请公布号 JPS61247026(A) 申请公布日期 1986.11.04
申请号 JP19850087552 申请日期 1985.04.25
申请人 CANON INC 发明人 MATSUSHITA KOICHI;ISOHATA JUNJI;YAMAMOTO SEKINORI;MIYAZAKI MAKOTO;OZAWA KUNITAKA;YOSHINARI HIDEKI
分类号 H01L21/30;G03F7/20;G03F9/00;H01L21/027 主分类号 H01L21/30
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